Overview
A graduate-level description of recent Japanese research on the chemistry of amorphous silicon film deposition associated with plasma CVD, a step in producing amorphous semiconductors. Reports on studies (of microscopic processes of gas-phase reaction as well as chemical reactions on the film growin
- | Author: K. Tanaka
- | Publisher: Springer
- | Publication Date: Nov 30, 1989
- | Number of Pages: 277 pages
- | Binding: Hardback or Cased Book
- | ISBN-10: 0792303091
- | ISBN-13: 9780792303091
