Overview
This book surveys the major and newly developed techniques for semiconductor strain metrology. Semiconductor strain metrology has emerged in recent years as a topic of great interest to researchers involved in thin film and nanoscale device characterization. This book employs a tutorial approach to explain the principles and applications of each technique specifically tailored for graduate students and postdoctoral researchers. Selected topics include optical, electron beam, ion beam and synchrotron x-ray techniques. Unlike earlier references, this book specifically discusses strain metrology as applied to semiconductor devices with both depth and focus.
- | Author: Terence K. S. Wong
- | Publisher: Bentham Science Publishers
- | Publication Date: Feb 01, 2018
- | Number of Pages: 142 pages
- | Language: English
- | Binding: Paperback/Science
- | ISBN-10: 160805554X
- | ISBN-13: 9781608055548
