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CMOS Plasma and Process Damage

CMOS Plasma and Process Damage

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Product Details
Author:
Kirk Prall
Publisher:
Springer
Publication Date:
May 17, 2025
Number of pages:
00466 pages
Binding:
Hardback or Cased Book
ISBN-10:
3031890280
ISBN-13:
9783031890284

Overview

This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems.


  • | Author: Kirk Prall
  • | Publisher: Springer
  • | Publication Date: May 17, 2025
  • | Number of Pages: 00466 pages
  • | Binding: Hardback or Cased Book
  • | ISBN-10: 3031890280
  • | ISBN-13: 9783031890284

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