Atomic Layer Deposition 2e

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

• | Author: Tommi Kääriäinen
• | Publisher: Wiley-Scrivener
• | Publication Date: May 28, 2013
• | Number of Pages: 272 pages
• | Binding: Hardback or Cased Book
• | ISBN-10: 1118062779
• | ISBN-13: 9781118062777