Overview
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
- | Author: Cheol Seong Hwang, Cheol Seong Hwang
- | Publisher: Springer
- | Publication Date: Aug 23, 2016
- | Number of Pages: 273 pages
- | Language: English
- | Binding: Paperback/Science
- | ISBN-10: 1489979433
- | ISBN-13: 9781489979438
