Machine Learning-Based Modelling in Atomic Layer Deposition Processes

This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

• | Author: Oluwatobi Adeleke
• | Publisher: CRC Press
• | Publication Date: May 06, 2025
• | Number of Pages: 00354 pages
• | Binding: Paperback or Softback
• | ISBN-10: 1032386738
• | ISBN-13: 9781032386737